Critical Marangoni Numbers and Their Effect on the Dopant Distribution in Silicon Fibers

Critical Marangoni Numbers and Their Effect on the Dopant Distribution in Silicon Fibers

INTERNATIONAL JOURNAL OF MATHEMATICAL MODELS AND METHODS IN APPLIED SCIENCES Critical Marangoni numbers and their effect on the dopant distribution in silicon fibers L. Braescu, and T. F. George process. If aluminum is already present as a grown-in impurity Abstract—The dependence of the Marangoni flow and impurity in the starting material, then it can act as an electrically-active distribution on the vertical temperature gradient is analyzed in the defect with detrimental consequences to the charge carrier framework of a stationary model including the incompressible lifetime [3]. Navier-Stokes equation in the Boussinesq approximation and the Molten silicon is known to be an extremely-reactive convection-conduction, and conservative convection-diffusion equations. The computations are carried out in a 2D axisymmetric material [4], with strong thermal forcing in surface-tension- model by the finite-element numerical technique, for aluminum- driven flows being realized during the growth process. The doped silicon fibers grown from the melt by the edge-defined film- surface tension value and its temperature dependence are fed growth technique, and reveal existence of the three critical essential for describing surface-tension-driven flow Marangoni numbers due to thermal gradients. The homogeneity of (Marangoni-Bénard flow) on the free liquid surface the dopant distribution in the crystal is computed for different (meniscus, i.e., the liquid bridge between the die and the Marangoni numbers situated in the ranges determined by the crystal) [5]. It is generally accepted that thermal fluctuations obtained critical Marangoni numbers Mac1, Mac2, Mac3. are a serious drawback in growing a high-quality crystal. The Keywords—Boussinesq approximation, critical Marangoni existence of Marangoni convection for molten silicon has number, finite element technique, fluid flow. been revealed through crystal growth experiments using the Cz [6] and Fz [7] configurations. For the former, the I. INTRODUCTION dependence on the Marangoni-Bénard and Rayleigh-Bénard HE demand for single or poly-silicon has increased instabilities on the coefficient dγ/dT of temperature dramatically due to the rapid expansion of the dependence of the surface tension was confirmed. The Tphotovoltaic PV industry. Various growth techniques contribution of the Marangoni effect to the instabilities and have been used for producing silicon wafers for a PV cell, like consequently to the impurity distribution in the crystal is the Czochralski Cz, floating zone Fz and edge-defined film- governed by the magnitude of dγ/dT. Although a large amount fed growth EFG methods. Among these, EFG is the first non- of surface tension data has been reported for molten silicon conventional technique for crystalline silicon wafer [5], there is still some uncertainty concerning the absolute production to enter into large-scale manufacturing in the values and its temperature dependence, because the surface photovoltaic industry [1], with ribbon growth of silicon tension of molten silicon is quite sensitive to surface meeting the actual demands of economical material contamination, particularly oxygen. These reasons and the consumption because it avoids silicon losses, such as during difficulty of an experimental investigation of the surface- the blocking of ingots or sawing of wafers [2]. tension-driven Marangoni-Bénard convection for small Identifying and investigating the metal impurities in silicon Prandtl numbers (Pr = 0.01 for silicon) have been the are fundamental tasks in semiconductor physics and device motivation for a numerical analysis of the dependence of the engineering. In solar cells, aluminum is usually present in the Marangoni flow and impurity distribution on the vertical metal back contact as well as in the back surface field region. temperature gradient. Due to a low diffusivity of interstitial aluminum in silicon, This analysis is made on the aluminum-doped silicon fibers compared to the diffusivity of the transition metals, silicon is grown from the melt by EFG technique using a central intentionally contaminated with aluminum during the growth capillary channel CCC shaper design (see Fig.1). It is also assumed that, the melt level in the crucible is constant during the growth process (i.e., continuous melt Manuscript received September 9, 2008: Revised version received September 22, 2008. This work was supported by the North Atlantic Treaty replenishment) and, the radius of the fiber and the meniscus Organisation under Grant CBP.EAP.CLG 982530. height, respectively, are constant (i.e. the effect of the pulling L. Braescu is with the Computer Science Department, West University of rate variation concerning the rod radius variation and the Timisoara, Blv. V Parvan 4, Timisoara 300223, ROMANIA (corresponding author phone: +4-025-659-2221; fax: +4-025-659-2316 e-mail: meniscus height variation are compensated by an adequate lilianabraescu@ balint1.math.uvt.ro). temperature variation). T. F. George is with the Chemistry & Biochemistry and Physics & Astronomy Departments, University of Missouri-St. Louis, MO 63121, USA (e-mail: [email protected]). Issue 3, Volume 2, 2008 432 INTERNATIONAL JOURNAL OF MATHEMATICAL MODELS AND METHODS IN APPLIED SCIENCES The axis-symmetric solutions are searched in the cylindrical- polar coordinate system (rOz) corresponding to the EFG technique having a central capillary channel shaper design (see Fig. 2). Fig.1: Schematic EFG crystal growth system. Fig. 2: Schematic EFG crystal growth system showing the The computations are carried out in the stationary case in a domain boundaries (a) and dimensions (b) used in the 2D axisymmetric model by the finite-element numerical numerical model. technique using COMSOL Multiphysics 3.4 software [8]- [10], for 38 different values of dγ/dT situated in the maximal range In this system, the unknowns are: velocity vector u = [-7×10-4; 0] Nm-1K-1 (i.e., for Marangoni numbers Ma (u,v), temperature T, impurity concentration c, and pressure between zero and 406.25), which contains all values reported p. The material parameters are: ρl - reference melt density, β - in literature [5], and for three representative vertical heat expansion coefficient, η - dynamical viscosity, k - temperature gradients in the furnace: kg1 = 5,000; kg2 = 50,000; thermal conductivity, Cp - heat capacity, D - impurity -1 - kg3 = 100,000 Km situated in the range [5,000; 100,000] Km diffusion, and g - gravitational acceleration. The system (1) 1 determined by experimental data [11]. These numerical is considered in the two-dimensional domain whose investigations prove the existence of three critical Marangoni boundary is from Ω1 to Ω10, as represented on Fig. 2(a). numbers – Mac1, Mac2, Mac3 – as reported for two-dimensional The fluid density is assumed to vary with temperature as containers [12]-[14]. The computed fluid flows reveal that, the ρ(r, z)(= ρl [] 1− β T ( r , z ) − Δ T ), (2) best homogeneity of the dopant distribution in the crystal is and the surface tension γ in the meniscus is assumed to vary obtained for lower Marangoni numbers. The length of the linearly with temperature as ranges determined by these lower Marangoni numbers dγ , (3) increases if the vertical temperature gradient in the furnace γ()z,r = γ l + (T( r,z )− Δ T ) decreases. This suggests a possible future feedback control of dT the Marangoni-Bénard instability which can delay the where ΔT = (T0+Tm)/2 is the reference temperature at the free Marangoni convection [15] through a particular choice of the surface, γl is the surface tension at the temperature ΔT, and process parameters (for example: a small vertical temperature dγ/dT is the rate of change of surface tension with the gradient), in order to optimize the crystal quality. temperature. The main parameter of the Marangoni-Bénard convection is the Marangoni number dγ ()T− T ⋅ h II. THE MATHEMATICAL MODEL Ma = ⋅ m 0 , (4) The Marangoni flow and impurity distribution induced by dT η⋅ α vertical temperature gradients in the furnace is analyzed in the where η is the dynamic viscosity, α = k/ρl Cp is the thermal framework of a stationary model including the incompressible diffusivity, and h the meniscus height. Navier-Stokes equation in the Boussinesq approximation (the For solving the system (1), boundary conditions on Ω1 to Ω10 temperature-dependent density appears only in the are imposed, with the Oz-axis considered as a line of symmetry gravitational force term), and the convection-conduction and for all field variables: conservative convection-diffusion equati ons [16]: - Flow conditions: On the melt/solid interface, the condition ⎧ T ρ ρl ()u⋅∇=∇⋅− u[ p I +∇+∇η( u() u)] +βρl g ⋅()TT − Δ of outflow velocity is imposed, i.e., l , where k ⎪ u= v0 k ⎪ ∇ ⋅u = 0 . (1) ρs ⎨ represents the unit vector of the Oz-axis. On the melt level in ⎪ ∇ ⋅( −k ∇ T + ρl C p Tu)= 0 ⎪ ∇ ⋅( −D ∇ c + cu) = 0 the crucible, the inflow velocity condition is imposed (melt ⎩ 2 replenishment), R . On the meniscus free u = − 2 2 ⋅v0 k RRc − 0 Issue 3, Volume 2, 2008 433 INTERNATIONAL JOURNAL OF MATHEMATICAL MODELS AND METHODS IN APPLIED SCIENCES -1 -1 surface, we set up the slip/symmetry condition, u⋅ n = 0 , tension (N m K ) 2 -1 -8 T D impurity diffusion (m s ) 5.8×10 t⋅[ −p I +η( ∇ u +() ∇ u)] n = 0 , where t and n represent the -3 Dl die length (m) 45×10 tangential and normal vectors, respectively. The other g gravitational acceleration (m s-2) 9.81 boundaries are set up by the non-slip condition u= 0 . h meniscus height (m) 0.5×10-3 - Thermal conditions: On the melt/solid interface, we set the k thermal conductivity (W m-1K-1) 64 -1 temperature as T = Tm. On the free surface, we impose thermal kg vertical temp. gradient (K m ) 50000 insu lation, i.e., . For the other K0 partition coefficient 0.002 n ⋅( −k ∇ T + ρl C p T u)= 0 η dynamical viscosity (kg m-1s-1) 7×10-4 boundaries, we have the temperature condition T = T .

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