The 11th Conference on Lasers and Electro-Optics Pacific Rim www.cleopr2015.org Conference Program & Abstracts CLEO-PR 2015 CLEO-PR Organized by Optical Society of Korea Technically Co-sponsored by The Optical Society IEICE Electronics Society Conference Program & Abstracts IEICE Communications Society The Japan Society of Applied Physics IEEE Photonics Society KPS Optics and Quantum Electronic Division Supported by CLEO Pacific Rim 2015 Secretariat E-mail: [email protected] Busan Tourism Organization Tel: 82-42-472-7458 Korea Tourism Organization The Korean Federation of Science and Technology Societies The Korean Academy of Science Technology IEEE ES Electronics Society photonics IEICE SOCIETY Communications Society & Accessories Coherent EUV Light Source Light Source EUV Coherent Program at a Glance 레 이 저 스 펙 트 라 Aug. 24 (Mon) Time 101 (Room A) 102 (Room B) 103 (Room C) 106 (Room D) 107 (Room E) 108 (Room F) 201 (Room G) 202 (Room H) 203 (Room I) 204 (Room J) 205 (Room K) 16:30~17:30 Short Short Short 17:30~18:30 Course I Course II Course III eXtra-Coherent EUV Light Source 18:30~20:00 Get-together Party (Lobby, 3F) Aug. 25 (Tue) Time 101 (Room A) 102 (Room B) 103 (Room C) 106 (Room D) 107 (Room E) 108 (Room F) 201 (Room G) 202 (Room H) 203 (Room I) 204 (Room J) 205 (Room K) System between 10-30nm 08:40~09:00 Opening Ceremony 09:00~09:45 Plenary Talk I COHERENT EUV IMAGING, ACTINIC INSPECTION IN THE EUV LITHOGRAPHY 09:45~10:30 Plenary Talk II [25A1] [25B1] [25C1] [25D1] [25E1] [25F1] [25G1] [25H1] [25I1] [25J1] 11:00~12:30 T01: Raman Lasers T13: Novel Devices T02: Femtosecond T04: High Power, High T05: Plasmonics and T07: Optical Metrology T08: Quantum T09: Nanostructures T10: Plasmonic T12: Silicon Photonics The eXtra is the extreme UV (EUV) spectra light source system* and Systems for Laser Energy Lasers Metamaterials I and Sensing I Optomechanics Devices Interconnection Display which is based on the high harmonic generation (HHG) in the laser- [25A2] [25B2] [25C2] [25D2] [25E2] [25F2] [25G2] [25H2] [25I2] [25J2] produced plasma to provide the coherent (laser-like) spectra be- 13:45~15:15 T01: Optical T01: Material T02: Attosecond T04: High Power, High T05: Plasmonics and T07: Optical Metrology T08: Quantum T09: Material T10: Plasmonics T12: Silicon Photonics Frequency Combs Processing & Physics Energy Lasers Metamaterials II and Sensing II Information I and Device and Subwavelength Integration tween 10nm and 30nm. The system is configured with a kHz rep rate, Applications Characterizations Structures femtosecond Ti:sapphire laser at wavelength around 800nm, and a [25A3] [25B3] [25C3] [25D3] [25E3] [25F3] [25G3] [25H3] [25I3] [25J3] 15:45~17:45 T01: Q-switched T01: Solid-State & T02: Nonlinear Optics T06: Novel Laser T05: Plasmonics and T07: Optical Metrology T08: Atom-Photon T11: Multiphoton T10: Photonic Crystals T12: Silicon Photonics gas cell with gas handling assembly under vacuum. The laser pulses Lasers Diode Lasers Process for Electronic Metamaterials III and Sensing III Interaction I Microscopy Hybrid Integration 14 15 2 Devices are focused with intensity of 10 -10 W/cm into the patent-pending Aug. 26 (Wed) gas cell to produce the gas plasma inside the cell. The generated Time 101 (Room A) 102 (Room B) 103 (Room C) 106 (Room D) 107 (Room E) 108 (Room F) 201 (Room G) 202 (Room H) 203 (Room I) 204 (Room J) 205 (Room K) EUV spectra are separated from the laser wavelength with an ap- [26A1] [26B1] [26C1] [26D1] [26E1] [26F1] [26G1] [26H1] [26I1] [26J1] propriate combination of the EUV beamsplitters and filters. 09:00~10:30 T01: High-Power T06: Laser Processing T02: Fiber Laser T04: Ultrahigh Intensity T05: Plasmonics and T07: Optical Metrology T08: Atomic Physics T09: Growth and T10: Waveguides T12: Micro Cavity Solid-State Lasers for Flexible Electronics Lasers I Metamaterials IV and Sensing IV Fabrications Devices [26A2] [26B2] [26C2] [26D2] [26E2] [26F2] [26G2] [26H2] [26I2] [26J2] The EUV spectra generated depends on various parameters includ- 11:00~12:30 T01: Mode-Locked T06: Ultrashort Pulsed T02: Novel Materials T04: Ultrahigh Intensity T05: Plasmonics and T07: Optical Metrology T08: Quantum T11: Optical T10: Advances in T12: III-V Integrated Lasers I Laser 3D Processing Lasers II Metamaterials V and Sensing V Information II Coherence Metamaterials Photonics ing the laser intensity, gases, gas pressure and cell manifold. The Tomography eXtra-13.5 is highly focused to a spectra 13.5nm which is the 59th 13:45~15:15 Poster Session 1 (Exhibition Hall, 1F) harmonics of the laser wavelength 800nm, and exactly matched with [26A3] [26B3] [26C3] [26D3] [26E3] [26F3] [26G3] [26H3] [26I3] [26J3] 15:45~17:45 T01: Mode-Locked T13: 3D Display T02: Supercontinuum T06: Novel Laser and T05: Plasmonics and T07: Optical Metrology T08: Atom-Photon T11: Tissue Imaging T10: Micro/Nano T12: Nanophotonics the wavelength of the semiconductor EUV lithography. The system Lasers II Generation Optical Technologies Metamaterials VI and Sensing VI Interaction II Lasers Applications in Manufacturing I provides a compact, table-top solution for the actinic inspection and 18:00~20:00 Banquet (301) metrology applications in the EUV lithography. The Fig.1 shows its Aug. 27 (Thu) typical EUV spectra generated on the Ne gas pumped with 35fs Time 101 (Room A) 102 (Room B) 103 (Room C) 106 (Room D) 107 (Room E) 108 (Room F) 201 (Room G) 202 (Room H) 203 (Room I) 204 (Room J) 205 (Room K) Ti:sapphire laser pulses of 5mJ at 1kHz. The peak at 13.5nm is - EUV Sources 09:00~09:45 Plenary Talk III dominated with the Zr filter. The calibration was done with the spec- 09:45~10:30 Plenary Talk IV tra of Al filter. (*developed under research collaboration with KIST, - Spectrometer [27A1] [27B1] [27C1] [27D1] [27E1] [27F1] [27G1] [27H1] [27I1] [27J1] Korea Institute of Science and Technology) 11:00~12:30 T01: Tm Fiber Lasers T03: Terahertz T02: Strong Field T04: High Power, High T05: Plasmonics and T07: Optical Metrology T08: Atom-Photon T09: Novel Materials T10: Biosensors T12: Integrated Optical Technologies and Physics Energy Lasers I Metamaterials VII and Sensing VII Interaction III and Devices Devices - EUV detector Applications I 13:45~15:15 Poster Session 2 (Exhibition Hall, 1F) Fig.1 [27A2] [27B2] [27C2] [27D2] [27E2] [27F2] [27G2] [27H2] [27I2] [27J2] 15:45~17:45 T01: Solid-State & T03: Terahertz T02: Characterization T10: Quantum T06: Novel Laser and T07: Optical Metrology T08: Quantum T11: Innovative T13: Advanced T12: Microcavity Mid-IR Lasers Technologies and of Ultrashort Laser Phenomena in Micro/ Optical Technologies and Sensing VIII Information III Methods in Imaging Techniques Integrated Devices Applications II Pulses Nano Optics in Manufacturing II Biophtonics 18:00~19:30 Post-deadline Papers Aug. 28 (Fri) For more infor- Time 101 (Room A) 102 (Room B) 103 (Room C) 106 (Room D) 107 (Room E) 108 (Room F) 201 (Room G) 202 (Room H) 203 (Room I) 204 (Room J) 205 (Room K) mation, please [28A1] [28B1] [28C1] [28D1] [28E1] [28F1] [28G1] [28H1] [28I1] [28J1] contact : 09:00~10:30 T01: Fiber-based T03: Terahertz T02: Nonlinear Optics T04: High Power, High T05: Plasmonics and T07: Optical Metrology T01: Novel Lasers & T11: Plasmonics in T13: Holographic T12: Band-broadening Sources Technologies and Energy Lasers II Metamaterials VIII and Sensing IX Techniques Biophotonics Display Photonics Applications III [28A2] [28B2] [28C2] [28D2] [28E2] [28F2] [28G2] [28H2] [28I2] [28J2] 레이저스 펙트 라 11:00~12:30 T01: Mid-IR OPOs T03: Terahertz T09: Light Emitting T10: Micro/ T05: Plasmonics and T07: Optical Metrology T01: Optical Mode T11: In vivo and In T13: Optical Storage T12: Nano Grating & High-Power Fiber Technologies and Devices Nanophotonics Metamaterials IX and Sensing X Control vitro and Information Lasers Lasers Applications IV Processing Laser Spectronix T01 Solid State, Fiber, and Other Laser Sources T06 Laser Processing and Innovative Applications T11 Biophotonics and Medical Optics Byucksan Digital Valley 6-406, T02 Ultrafast Phenomena and Nonlinear Optics T07 Optical Metrology and Sensing T12 Semiconductor and Intergrated Optical Devices Gasan-dong, Geumcheon-gu, T03 Terahertz Technologies and Applications T08 Quantum Optics, Atomic Physics, and Quantum Information T13 Display, Storage, and Applications Seoul, KOREA T04 High Power, High Energy Lasers T09 Nitrides, Other Widegap Semiconductors Tel: (02) 2627-3121 T05 Plasmonics and Metamaterials T10 Micro and Nanophotonics Fax: (02) 2627-3120 email: [email protected] home: www.laser.co.kr & Accessories Program at a Glance Light Source EUV Coherent INTERNATIONAL 레 이 저YEAR 스OF LIGHT 펙 트 라 Aug. 24 (Mon) 2015 Time 101 (Room A) 102 (Room B) 103 (Room C) 106 (Room D) 107 (Room E) 108 (Room F) 201 (Room G) 202 (Room H) 203 (Room I) 204 (Room J) 205 (Room K) 16:30~17:30 Short Short Short 17:30~18:30 Course I Course II Course III eXtra-Coherent EUV Light Source 18:30~20:00 Get-together Party (Lobby, 3F) Aug. 25 (Tue) Time 101 (Room A) 102 (Room B) 103 (Room C) 106 (Room D) 107 (Room E) 108 (Room F) 201 (Room G) 202 (Room H) 203 (Room I) 204 (Room J) 205 (Room K) System between 10-30nm 08:40~09:00 Opening Ceremony Table of Contents 09:00~09:45 Plenary Talk I COHERENT EUV IMAGING, ACTINIC INSPECTION IN THE EUV LITHOGRAPHY 09:45~10:30 Plenary Talk II [25A1] [25B1] [25C1] [25D1] [25E1] [25F1] [25G1] [25H1] [25I1] [25J1] 11:00~12:30 T01: Raman Lasers T13: Novel Devices T02: Femtosecond T04: High Power, High T05: Plasmonics and T07: Optical Metrology T08: Quantum T09: Nanostructures T10: Plasmonic T12: Silicon Photonics The eXtra is the extreme UV (EUV) spectra light source system* and Systems for Laser Energy Lasers Metamaterials I and Sensing I Optomechanics Devices Interconnection Display which is based on the high harmonic generation (HHG) in the laser- [25A2] [25B2] [25C2] [25D2] [25E2] [25F2] [25G2] [25H2] [25I2] [25J2] produced plasmaI.