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Mechanical Gate Control for Atom-By-Atom Cluster Assembly with Scanning Probe Microscopy

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Mechanical Gate Control for Atom-By-Atom Cluster Assembly with Scanning Probe Microscopy ARTICLE Received 3 Feb 2014 | Accepted 6 Jun 2014 | Published 11 Jul 2014 DOI: 10.1038/ncomms5360 Mechanical gate control for atom-by-atom cluster assembly with scanning probe microscopy Yoshiaki Sugimoto1, Ayhan Yurtsever2, Naoki Hirayama1, Masayuki Abe3,w & Seizo Morita2 Nanoclusters supported on substrates are of great importance in physics and chemistry as well as in technical applications, such as single-electron transistors and nanocatalysts. The properties of nanoclusters differ significantly from those of either the constituent atoms or the bulk solid, and are highly sensitive to size and chemical composition. Here we propose a novel atom gating technique to assemble various atom clusters composed of a defined number of atoms at room temperature. The present gating operation is based on the transfer of single diffusing atoms among nanospaces governed by gates, which can be opened in response to the chemical interaction force with a scanning probe microscope tip. This method provides an alternative way to create pre-designed atom clusters with different chemical compositions and to evaluate their chemical stabilities, thus enabling investigation into the influence that a single dopant atom incorporated into the host clusters has on a given cluster stability. 1 Department of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1, Yamada-Oka, Suita, Osaka 565- 0871, Japan. 2 Nanoscience and Nanotechnology Center, The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan. 3 Department of Materials Science and Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan. w Present address: Center for Science and Technology under Extreme Conditions, Graduate School of Engineering Science, Osaka University, 1-3, Machikaneyama-Cho, Toyonaka, Osaka 560-8531, Japan. Correspondence and requests for materials should be addressed to Y.S. (email: [email protected]). NATURE COMMUNICATIONS | 5:4360 | DOI: 10.1038/ncomms5360 | www.nature.com/naturecommunications 1 & 2014 Macmillan Publishers Limited. All rights reserved. ARTICLE NATURE COMMUNICATIONS | DOI: 10.1038/ncomms5360 anoclusters supported on substrates are of great impor- the structure and the stability of these bimetallic clusters can tance in physics and chemistry as well as in technical contribute to our understanding of the interaction of the doped Napplications, such as single-electron transistors1,2, atom with the metal clusters. nanocatalysts3–5 and quantum computing devices6. The In this study, we propose an alternative approach to the properties of nanoclusters are highly sensitive to size and assembly of various nanoclusters atom-by-atom using the tip of a chemical composition. Despite their inert bulk properties, for scanning probe microscope (SPM) at RT. This method is based example, nanosized Au clusters exhibit high catalytic activities for on the transfer of single diffusing atoms among nanospaces (NSs) a wide variety of chemical reactions3, showing clear quantum size governed by gates, which can be opened in response to the effects on catalytic behaviour5. The development of methods to chemical interaction force with the SPM tip. This method fabricate atomically well-defined clusters is therefore necessary provides a way to create pre-designed atom clusters with different for a fundamental understanding of their properties and for chemical compositions and to evaluate their chemical stabilities. designing better materials and devices. Various approaches have been developed to create nanoclusters with different functionalities on surfaces. Among these methods, Results the self-assembling is the most widely used method for fabricating Transfer of diffusing adsorbates by atom gating. Half-unit cells nanoclusters, where atoms/molecules are evaporated onto a (HUCs) of the Si(111)-(7  7) surface serve as NS arrays to surface followed by thermal annealing, leading to the spontaneous confine individual adsorbates diffusing on the surface. Single formation of clusters7. To unveil the unique properties of these atoms deposited on the surface, such as group IV elements (Si, Sn clusters in practical applications, it is essential to control their size and Pb) and noble metals (Ag and Au), thermally diffuse within and uniformity. Although the uniformity of cluster arrays has the NSs at RT as demonstrated in Fig. 1. A potential energy been achieved using the so-called template-induced cluster barrier existing between NSs prohibits inter-NS thermal diffusion. formation method8,9, these methods do not provide direct The diffusion rate within the NS is so large that a SPM cannot access to the precise determination of the number of atoms resolve the specific adsorption sites offered by the surface at RT20 involved in a cluster structure once they are deposited on (further information can be found in Supplementary Note 1). The surfaces. different adsorbate atoms on the surface appear differently in the Complementary to these methods, the scanning probe method SPM images owing to differences in their diffusion properties offers precise positioning capabilities with atomic precision10. (Fig. 1b–i). These capabilities have led to the creation of various The clusters with predetermined compositions, such as Au12, artificial nanostructures atom-by-atom, mainly at cryogenic Ag12 and Au5Pb, can be formed by collecting single atoms from temperatures11–14. This method was later extended to room the surrounding NSs into a predefined NS with successive gate 15 temperature (RT) by means of atomic force microscopy (AFM) , controls. Hereafter, AuN represents the Au cluster with N Au which provides an opportunity to directly measure the forces that atoms and the term ‘cluster’ refers to an ensemble of foreign induce the atomic motion in the manipulation process16–18. atoms bonded to the Si(111)-(7  7) surface. An adsorbate Despite these achievements, assembly of the well-defined clusters diffusing within a NS can be transferred to an adjacent NS by exhibiting high thermal stability at RT and the precise the tip proximity near the border, but slightly shifted away from determination of the cluster size and hence of the number of the NS where the diffusing atom is located. The gate associated atoms involved in a cluster structure remains a challenging task19. with the potential energy barrier that hinders the mobility of an More importantly, assembling of atomically well-defined clusters adsorbate between NSs can be opened by the following from multi-elements at RT has not been demonstrated yet despite consecutive steps. First, the tip is positioned over the predefined their wide range of technical applications. The investigation of site marked with a cross as in Fig. 1a, and then the tip-to-surface U F Ag Sn UF Au Pb U F Ag Sn Au Pb 1 nm Figure 1 | Demonstrations of the transfer of a single atom by gate control. (a) A HUC in the Si(111)-(7  7) surface works as a NS of an equilateral triangle with side lengths of 2.7 nm. F and U denote faulted and unfaulted HUC, respectively. The adsorbate atom travels among the various potential minima in a NS; these minima are known to be multi-coordinate sites rather than the tops of Si adatoms and rest atom sites26. The tip gradually approaches the position as indicated by a cross in the Si(111)-(7  7) unit cell for the gate-opening process. This process initiates the atom transfer between two NSs. (b–g) The corresponding STM images at Vs ¼À1,000 mV exemplify the atom transfer ability using gate control for (b,c) Au, (d,e) Ag and (f,g) Pb. The tunnelling current set points are (b,c) 30, (d,e) 50 and (f,g) 40 pA. The white dashed triangles mark the initial (b,d and f) and final (c,e and g) locations of adsorbates transferred by gate control. (h,i) AFM images showing Sn atom transfer by atom gating with AFM tip at Vs ¼ 0 V. The acquisition parameters À 1 were f0 ¼ 153,972.5 Hz, k ¼ 25.2 N m , A ¼ 198 Å and Df ¼À2.1 Hz. 2 NATURE COMMUNICATIONS | 5:4360 | DOI: 10.1038/ncomms5360 | www.nature.com/naturecommunications & 2014 Macmillan Publishers Limited. All rights reserved. NATURE COMMUNICATIONS | DOI: 10.1038/ncomms5360 ARTICLE 10–3 –60 101 –4 –80 10 Approach 0.2 0 ) –100 0.0 10 0 10–5 –0.2 Retract (Hz) (G (nA) f –0.4 t G I –120 (nN) –1 –0.6 10 SR –6 F –0.8 10 Retract Retract –140 –1.0 –1.2 10–2 Approach 0 1234 –7 10 –160 z (Å) 01234 01234 z (Å) z (Å) Figure 2 | STM and AFM observables during atom gating. (a) Typical It(z) curves acquired with static STM at Vs ¼À500 mV, revealing the evolution of the current (left axis) and conductance (right axis) during the Au atom gating process with the STM tip as a function of the tip–sample relative 2 À 1 displacement. Here G0 ¼ 2e /h ¼ (12,906 O) . The spectroscopic measurements were performed over the site near the boundary of NSs, but slightly shifted away from the NS occupied by a Au atom. The inset schematics in a show the Au atom dynamics during the approach and retraction cycle of the tip (Au atom jump, Au atom trap and release). (b) The variation of the Df signal as a function of the tip–sample distance during approach and retraction acquired with AFM. The inset in b shows the short-range force extracted from the Df(z) curve, revealing the characteristic forces attributed to the trapping of a Au atom (black arrow) and junction formation by the chemical bond between the tip and the Au atom (red arrow). To extract the short-range force, the long-range background part, which is estimated from the approach Df(z) curve on the bare Si surface, was subtracted from the retraction Df(z) curve.
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